Functional Amorphous Carbon Film
（Atsushi HIRATA）
Amorphous carbon is a thin film material with high lubricity, high chemical stability, and high mechanical strength. In this laboratory, hard amorphous carbon films are deposited by electron beam excited plasma PVD, RF magnetron sputtering, and HiPIMS. We also aim to realize composite thin films with fluorescent wear detection, thin films with low electrical resistivity and static dissipation by adding small amounts of metallic elements, and highly functional films with nano-level micro-pores on the substrate to suppress exfoliation.
Amorphous carbon film deposited on Si substrate